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    Reactive Ion Etching (RIE) Reactive ion etchers are parallel plate, capacitively coupled plasma etchers wherein the substrate sits on the powered electrode An RF power, in most cases at 13 56MHz, is applied to the powered electrode The powered electrode area is typically smaller than the grounded electrode area
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    Samco offers reliable and durable Reactive Ion Etching (RIE) systems for R D and production customers Our benchtop compact RIE etcher is a suitable tool for academic device research and die deprocessing for IC failure analysis Samco’s open load RIE systems and load lock RIE systems have a wide process window for plasma etching of various materials (silicon, dielectrics, compound





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